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This is a commercial-scale system for thin film
deposition. It uses 15"x5" targets and coats the periphery of a large
rotating drum. Multiple targets allow multilayer coatings to be
deposited. Reactive d.c. sputtering is employed, activated by a
microwave plasma. The microwave plasma is used to preclean substrates
and to activate the reactive gases. A wide variety of dielectrics can
coated, including aluminium oxide, aluminium nitride, silicon oxide,
hafnium oxide, ITO etc. Graded index materials such as aluminium oxynitrides
are a speciality at Paisley. Pure metals and mixed metal alloys can also
be deposited in this chamber. |
